Press Releases
Nanometrix Invited to Present at a symposium in Chile
March 25, 2008 – Montreal, Canada – Nanometrix’s Juan Schneider, Co-Founder and VP Technology, has been invited to present at the – Third International Symposium on Advanced Materials and Nanostructures - held at Viña del Mar, Chile from May 19th – 20th, 2008.
Nanometrix Invited to Present at INNO.08 in Montreal
February 11, 2008 – Montreal, Canada – Nanometrix’s Juan Schneider, Co-Founder and VP Technology, has been invited to present at - INNO.08 A SHOWCASE OF INNOVATION - held at Palais des congrès de Montréal from April 21st – 23rd, 2008. Mr. Schneider will speak about “Industrial Monolayers for Alternative Energy” in the Materials for the Solar and Wind Energy category. This category focuses on challenges in the development of materials and processes for the solar industry’s evolving technology.
Nanometrix Announced as 2007 Finalist for Canadian Innovation Award for New Technology
September 19, 2007 – Montreal, Canada – The Canadian Manufacturers & Exporters (CME) group announced Nanometrix as a Quebec Finalist in the 2007 Winners and Finalists for the NRC / IRAP Regional Canadian Innovation Award for New Technology. This prestigious qualification recognizes innovative excellence in the development and application of new process manufacturing technology in Canada.
Nanometrix to Present at NSTI Nanotech 2006
May 5, 2006 – Boston, MA – Nanometrix has been chosen as a presenting company to showcase their IP at the NSTI Nanotech Ventures showcase of Nanotech 2006, one of the world’s largest Nanotech venture and partnering forums. This event connects the world’s top Nanotech Venture executives with the world’s investment and industry leaders.
Nanometrix Wins Award at Emerging Nanobusiness Showcase
November 1, 2005, Montreal, Canada - Nanometrix, a developer of monolayer dependent nanotechnology, has been selected and won an award at the Emerging NanoBusiness Showcase, held November 1 - 3 in Chicago in conjunction with NanoCommerce/SEMI NanoForum. Nanometrix showcased how the company's ultra thin film, the Linear Coating deposition system, can apply photoresist and other polymer material down to 1.5nm in thickness with atomic smoothness (0.1nm), enabling the production of next generation advanced Semiconductor devices.
Nanometrix Honored with Award at SEMICON West Technology Innovation Showcase
July 11, 2005, Montreal, Canada - Global trade association Semiconductor Equipment and Materials International (SEMI) selected and awarded nanotechnology manufacturer Nanometrix for its ultra-thin film equipment at the third annual Technology Innovation Showcase. Nanometrix was one of 23 companies selected to present at the exclusive event, held July 11-15th in conjunction with the SEMICON West 2005 Tradeshow in San Francisco. SEMI created the Technology Innovation Showcase to highlight breakthrough technologies that are expected to significantly impact the Semiconductor industry. Participating companies had booth space and gave a 20-minute presentation. During the four-day-long event, Nanometrix showcased how the company's ultra-thin film, the Linear Coating deposition system, can apply photoresist and other polymer material down to 1.5nm in thickness with atomic smoothness (0.1nm), enabling the production of next generation advanced Semiconductor devices.
Nanometrix Moves Laboratories to J Armand-Bombardier Nanotechnology Center
April 6, 2005, Montreal, Canada - Nanometrix, Inc., a leading designer and manufacturer of monolayer based deposition systems used in the production of hydrogen fuel cells; Semiconductors and nanotechnology devices, today announced that it had moved its research laboratories to the J Armand-Bombardier Pavilion on the campus of École Polytechnique / University of Montreal, in Montreal. All research & development efforts will be directed out of this new location. The J Armand-Bombardier Pavilion inaugurated in May 2004 is the leading location for R&D in nanoscience and nanotechnology in Quebec.
Nanometrix breaks through Ultra Thin Photoresist ”Brick Wall”
November 14, 2004, Austin, TX, USA –Nanometrix Inc announces breakthrough in application of ultra thin photo resist and dielectrics for Semiconductors. Today at the SEMI NanoFourm in Austin Texas, Nanometrix announced that the firms research team has been successful in producing films of photo resist on silicon wafers ≤ 25nm in thickness.
Nanometrix Announces Follow-on Round
July 29, 2004, Montreal, Quebec, Canada – Nanometrix Inc announced today that it has closed a follow-on round of financing. The investor is the Business Development Bank of Canada (BDC).
Nanometrix Closes Seed Round
May 2, 2003, Montreal, Quebec, Canada – Nanometrix Inc announces that it has closed a round of seed financing. Investors are the Business Development Bank of Canada (BDC) "Technology Seed Ventures" group and Investissement Quebec.
Industry Experts Launch Nanometrix
June 20, 2001, Montreal, Quebec – Nanometrix is launched by co-founders Dr. Gilles Picard, VP of R&D with a PhD in Bio-Physics, and Juan Schneider, VP of Technology with a BSc in Physics and MSc in Bio-Physics. With years of expertise in coating physics and advanced materials, the Nanometrix founders capitalized on the nanotechnology trend to focus R&D efforts on their now-patented Schneider-Picard (SP) Process. The low cost-of-ownership process provides the Semiconductor industry with a breakthrough Linear Coating method that is gentle, environmentally-friendly and creates a high degree of uniformity across substrate surfaces.
